Temperature Dependence of Band Offsets at the Porous – Silicon/Crystilline-Silicon Heterojunction

A.J. EKPUNOBI

The temperature dependence of band offsets at the porous – silicon/crystallin – silicon material system has been studied within the framework of tight binding method. A model was deviced in terms of interatomic matrix element and linear expansivity. The model result of 0.0010eV/K at 300K is in good agreement with the experiment.