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Two-photon Sensitized Cationic Polymerization for 3D Nano/Micro Patterning
Prem Prabhakaran and Kwang-Sup Lee

This review summarizes the state of the art in materials used for two photon cationic polymerization in the context of two-photon lithography. Two-photon induced photoacid generation catalyzes the cationic chemical amplification reaction of either positive or negative photoresists. The design and applications of two-photon sensitized photoacid generating systems and photoresists employing cationic polymerization are discussed.

Keywords: two-photon lithography, cationic polymerization, photoacid generators, two-photon photoacid generators

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