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Microstructure and Properties of TiN/AlN Multilayer Thin Films Prepared by Pulsed Laser Deposition (PLD)
R.G. Song, J.P. Lu and P.H. Tang

TiN/AlN multilayer thin films were prepared on silicon substrates by pulsed laser deposition (PLD) in this paper. The microstructure and properties such as nanoindentation hardness, wear resistance and corrosion behavior were characterized. The results showed that there exist obvious effects of modulation ratio and N2 partial pressure on the microstructure and properties of the as-prepared TiN/AlN multilayer thin films. The main phases in the films are TiN and AlN. The hardness increases dramatically first and then decrease slightly with increasing the modulation ratio; while it increases with increasing the N2 partial pressure. In addition, the wear resistance and corrosion resistance of the films increase with increasing the N2 partial pressure.

Keywords: KrF excimer laser, TiN/AlN, multilayer thin films, pulsed laser deposition (PLD), microstructure, hardness, wear resistance, corrosion resistance

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