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Hollow Cathode Plasma Discharge: Mechanisms and Applications in Modern Sputtering Techniques
Khaled Hussien Metwaly and Yahia Hamdy Mohamed Elbashar
A hollow cathode discharge system was designed and tested using argon gas within a dedicated discharge chamber. The setup consisted of a hollow copper cathode and a disk-shaped mesh serving as the anode. Copper was chosen as the sputtering material for both electrodes. A single Langmuir probe was utilized to measure the axial variations in electron temperature and ion density within the plasma formed beyond the electrode gap. During the process, thin copper films were deposited onto quartz and glass substrates.
Keywords: Plasma physics, hollow cathode discharge, sputtering, copper thin film