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Pulsed Laser Deposition of Nanostructured Thin Films: A review
Haytham Elgazzar and Y.H. Elbashar

The increasing demand for pulsed laser thin films deposition in the last two decades referred to its unique advantages such as stoichiometric transfer of complex material, multilayer growth and flexibility. This paper highlights the concept of the PLD process with emphasis on the PLD parameters taking into consideration the deposition of SiC thin films as an example of a most common application of this process.

Keywords: Pulsed laser deposition, Silicon carbide, thin films, Silicon wafers, stoichiometric transfer

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